Trace element measurements using white synchrotron radiation
نویسندگان
چکیده
منابع مشابه
Looking at trace impurities on silicon wafers with synchrotron radiation.
Figure 1. TXRF spectrum of a clean Si wafer surface showing 6.4x10 atoms/cm Fe and 2.6x10 atoms/cm Cu. The Cl is a residue from the HCl solution used to clean the wafer surface and the Ag is a artifact from the particular collimator used in these studies. Other features seen in the spectrum are the Si substrate peak, the scatter peak at 11.2 keV and the escape peak at 9.4 keV. Looking at Trace ...
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ژورنال
عنوان ژورنال: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
سال: 1987
ISSN: 0168-583X
DOI: 10.1016/0168-583x(87)90669-0